Hydrogen interaction with EUVL-relevant optical materials
نویسندگان
چکیده
منابع مشابه
Hydrogen Interaction with Euvl-relevant Optical Materials
Mo/Si multilayer mirrors were exposed to deuterium ions with well-defined energies in order to gain insight into the effects of Extreme UV light driven plasma generation on reflective elements in commercial lithography equipment. Post-irradiation analysis by Rutherford Backscattering Spectrometry (RBS) showed erosion of both Mo and Si layers for the highest energy (50 eV/D) and exposure time (5...
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ژورنال
عنوان ژورنال: Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques
سال: 2010
ISSN: 1027-4510,1819-7094
DOI: 10.1134/s1027451010040026